A TCAD Compatible SONOS Trapping Layer Model for Accurate Programming Dynamics

F. Schanovsky, D. Verreck, A. Arreghini, G. Rzepa, Z. Stanojević, C. Kernstock, O. Baumgartner, M. Rosmeulen, and M. Karner
We present a TCAD model for the accurate description of charging kinetics of trapping layers in 3D gate-all-around VNAND SONOS devices. We build on the established description of the trapping layer as trap-rich semiconductor and show that a strongly field-dependent carrier mobility greatly improves the reproduction of experimental incremental step pulse programming (ISPP) slopes. The resulting model was implemented in a commercial TCAD simulator and shown to accurately predict ISPP and retention loss measurement data with one consistent parameter set.
Publication date: 16 May 2021
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