Terman Method to Study Threshold Voltage Hysteresis of Si/SiGe Heterostructures at Cryogenic Temperatures

B. Veryser, F. Stampfl, J. González-Medina, C. Godfrin, B. Raes, D. Wan, K. D. Greve, R. Loo, Y. Shimura, L. Panarella, M. Waltl, A. Grill, M. Houssa, and S. Tyaginov
Semiconductor device reliability at cryogenic temperatures has emerged as an important research area driven by quantum computing applications. Si/SiGe heterostructures have established themselves as a leading platform for quantum devices, yet charge trapping at interfaces remains a key reliability concern. This work presents a phenomenological approach to characterize interface trapping in Si/SiGe heterostacks using fixed charge approximations. We demonstrate that threshold voltage hysteresis observed in capacitance-voltage measurements from 4.2 K to 80 K can be accurately modeled by assigning fixed charges at each channel interface. By combining this methodology with the Terman method, we extract the trap energy distribution, revealing a peak located approximately 0.1 eV below the conduction band with a maximum density of $5 imes 10^12 extcm^-2 exteV^-1$. The extracted distributions show strong agreement with interface trap density of states reported in literature, supporting the hypothesis that fast-responding interface traps are the primary mechanism driving the observed hysteresis.
Publication date: 22 March 2026
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