A Physical Model for the Hysteresis in MoS extsubscript2 Transistors

T. Knobloch, G. Rzepa, Y. Y. Illarionov, M. Waltl, F. Schanovsky, B. Stampfer, M. M. Furchi, T. Mueller, and T. Grasser
Even though the hysteresis in the gate transfer characteristics of two-dimensional (2D) transistors is a frequently encountered phenomenon, the physics behind it are up to now only barely understood, let alone modeled. Here, we demonstrate that the hysteresis phenomenon can be captured accurately by a previously established non-radiative multiphonon model describing charge capture and emission events in the surrounding dielectrics. The charge transfer model is embedded into a drift-diffusion based TCAD simulation environment, which was adapted to 2D devices. Our modeling setup was validated against measurement data on a back-gated single-layer MoS2 transistor with SiO2 as a gate dielectric. We use the modeling approach to gain a thorough understanding of the hysteresis, which will help to control this problem in future devices.
Publication date: 01 April 2018
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